Any queries (other than missing content) should be directed to the corresponding author for the article. It is hoped that with such information, tantalum could become a viable alternative material for decreasing fouling rates in heat exchangers. pMDI is a part of the mixture separated during the synthesis of MDI; therefore, oligomers and other reactants will be present. Figure S1 C1s XPS spectrum of tantalum substrate, Figure S2 O1s XPS spectrum of tantalum substrate, Figure S3 Ta4f XPS spectrum of tantalum pentoxide reference material, Figure S4 Ta4p3/2 XPS spectrum of tantalum pentoxide reference material. 6.U.S. The decreased overlayer thickness can be accounted for by the cross‐linked network formed during curing as all the shorter chain oligomeric molecules will bind into one large network on the surface. �p��30,����>�a��YŻ�y�NoH�o���a���˲�x����4 �ѻyy�js��I��"v@D?`U8V�I��PM����} D�7�DTeQ�����QV�2�5������.u The full text of this article hosted at iucr.org is unavailable due to technical difficulties. �¯EoîÓ7Biõ*† İR˜84ftav�…ğrt¨'[L)} k hl"rí,>$ó’2L�Ğœúğ@פç;Y3f. Carbodiimides form from the reaction between two isocyanates. The amine product will spontaneously react with another isocyanate molecule forming a urea. O1s assignments were made to be in keeping with the identified C1s components and their FWHM restrained to 1.6 eV (Figure 6). If the nitrogen atom of pMDI is interacting with the substrate by donating electron density in a donor‑acceptor interaction, then upon ion bombardment in the SIMS process, these nitrogen atoms will more likely form NH4+ fragments. BE and number of organic components were set to be in keeping with Ta‐03 to maintain consistency between spectra. Huntsman PU, Botlek Rotterdam, The Netherlands. One common isocyanate precursor for many polyurethanes, and a focal point of this research, is methylene diphenyl diisocyanate (MDI). Ta‐02 also exhibits a lower NCO concentration compared with Ta‐04, and this is a result of the thinner organic overlayer as described above for Ta‐01 and Ta‐03. An appreciation of such chemistry is thus vital in the investigation of interfacial chemistry. This specific interaction will be explored in future work. It is resistant to hydrochloric, nitric, sulfuric, chromic and phosphoric acids at all concentrations up to boiling point, halogen gases up to 175°C, aqua regia, oxidising metal chlorides and organic acids. If you do not receive an email within 10 minutes, your email address may not be registered, Toxicological Review of Methylene Diphenyl Diisocyanate (MDI) (CAS No. For all the peak fitting, a Voigt function (70% Gaussian, 30% Lorentzian) peak shape was used. This would be amplified by the high atomic mass tantalum atom. The thicker layer of Ta‐01 (cured sample) gives confidence in the BE and FWHM of the N1s isocyanate component and was fitted first, constraining its FWHM to what was found in the corresponding analysis of pMDI. The crystal structure of tantalum pentoxide is still a matter of debate. Similar interactions have been proposed previously between pMDI and 316L stainless steel.9 This interaction is between the nitrogen atom of one of the isocyanate reaction products described in Figure 1 and a tantalum atom in the substrate. Enter your email address below and we will send you your username, If the address matches an existing account you will receive an email with instructions to retrieve your username, Reactions of isocyanates with (a) alcohol, (b) water, (c) amine, (d) isocyanate, (e) carbodiimide and (f) the structure of pMDI, The Ta4f spectrum of the metallic substrate shows tantalum is mainly present in the (V) state with small amounts of (IV) and (I) oxidation states present. Prior analysis of the tantalum substrate allowed accurate peak fitting of the overlapping Ta4p3/2 components in the N1s spectra of both low concentration samples (Figure 10). The high temperature requirement for uncatalysed carbodiimide formation accounts for the increased carbodiimide concentration in Ta‐03 (Figure 7). Tantalum is a versatile highly corrosion resistant material, which possesses a melting point of 2996°C, a density approximately twice that of carbon steel (16.6 g cm−3) and a similar thermal conductivity.12-16 These properties make tantalum a suitable material for applications in aggressive corrosive environments. The deviations of the assignment for these fragments (Δ) are all lower than 60 ppm, confirming their assignment. The BE and FWHM of the (IV) and (II) components were set relative to this (V) component and results from the substrate analysis. With the Ta4p3/2 (V) component fitted, the BE and FWHM of the (IV) and (II) components can be set, restrained to the values found in the substrate analysis and heights set to fit the shape of the spectrum. Water vapour is commonly found on the surface of untreated metals and will either hydrogen bond to the surfaces or form metal hydroxides.20 In standard conditions their abundance will be in the range of submonolayer—monolayer coverage. pure monomeric 4,4'‐methylene diphenyl isocyanate (MDI) (CAS number 101–68–8, EC number 615–005–00–9), at temperatures up to 38 °C a whitish‐yellow solid which is used in the industrial production of special plastics, varnish and glue components, moulding elastomers and "MDI … Similar interactions have been identified previously between pMDI and an Fe‐Cr alloy.10 For Ta‐01, the signal intensity about 396 eV was too low to reliably fit a nitride component when taking into account the overlapping Ta4p3/2 (II) component. The BE and FWHM of the (V) component were in agreement with previous studies.21, 22 The BE and FWHM of the (IV) and (II) components were chosen to obtain the correct peak shape on the lower BE side of the (V) component. Working off-campus? Establishing the surface chemistry of the sample substrate is essential to identify interface‐specific interactions. Multiple studies have identified similar bonding structures on steel surfaces with fourier‐transform infrared spectroscopy,7 X‐ray photoelectron spectroscopy (XPS) and ToF‐SIMS.8-10 A carbamate bond with steel surfaces was first identified by Chehimi and Watts. The hydrogen chloride and solvent are removed from the reaction mix by distillation and are reused. Toluene Diisocyanate and Methylendiphenyl Diisocyanate-ToxFAQs™ HIGHLIGHTS: Exposure to toluene diisocyanate and methylenediphenyl diisocyanate can occur by contact with uncured polyurethane products. As well as forming isocyanate dimers and trimers, they can react together to form carbodiimides. Static SIMS conditions (ion dose < 1013 ions per centimetre) were achieved using a 25‐keV Bi3+ primary ion beam, rastered over an area of 100 × 100 μm2. This is because of the lower abundance of longer polymeric pMDI networks in the considerably thinner layer of organic material in Ta‐01 than Ta‐03 and, therefore, proportionately fewer NCO groups. Exposure to these chemicals can affect the respiratory function. �$�ފ Wendler and Frazier (1996) found that when the wood is dry (moisture content < 5%), polymeric methylene diphenyl diisocyanate (pMDI) The rise in the concentration of the Nδ+ component in Ta‐02 originates from acid–base interactions between the nitrogen in pMDI and the tantalum of the substrate. Isocyanates undergo several competitive reactions. The high‐ and low‐concentration solutions were used to prepare thick and thin pMDI layers on tantalum allowing the examination of pMDI alone and the interface. Diphenylmethane diisocyanate (MDI) has a lower vapor pressure and is therefore less toxic than TDI. Reaction mass of 4,4'-methylenediphenyl diisocyanate and o-(p-isocyanatobenzyl)phenyl isocyanate / methylene diphenyl diisocyanate EC number: 905-806-4 | CAS number: - General information ET = exponential tail = 0.0507 (0 = infinite tail; 1 = no tail). BE were constrained to that of Ta‐03. The BE and FWHM of the Ta4p3/2 (V) component were readily defined from high BE side of the spectrum. This process will happen to a lesser extent, if at all, in the air‐dried sample. have investigated the interfacial chemistry between aluminum and a number of different MDI‐based polyurethane materials.3, 4With the use of time of flight secondary ion mass spectrometry (ToF‐SIMS), an interfacial urethane‐like bond was proposed. Taking into account the lower kinetic energy of the 4p3/2 electron compared with 4f electron, it is concluded that the (IV) and (II) oxidised tantalum species are located towards the surface of the oxide layer, in keeping with the theory of promoted oxide formation from the UV‐ozone cleaning process theorised above. Analysis of the tantalum pentoxide reference material has provided a guide of the expected XPS BE and FWHM of Ta4f and Ta4p3/2 components and has informed the accurate peak fitting of the substrate. Jump to main content Jump to site nav Home Binding energies (BE) of each component were set in ranges expected for their assignment with fine adjustments of ±0.1 eV being made to attain the best fit with experimental data.19 The O1s spectrum (Figure S2) agrees with the assignment of adventitious carbon as well as possessing a large oxide component.

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